1 Scope of the Report
1.1 Market Introduction
1.2 Years Considered
1.3 Research Objectives
1.4 Market Research Methodology
1.5 Research Process and Data Source
1.6 Economic Indicators
1.7 Currency Considered
1.8 Market Estimation Caveats
2 Executive Summary
2.1 World Market Overview
2.1.1 Global Chemical Mechanical Planarization (CMP) Slurries Annual Sales 2018-2029
2.1.2 World Current & Future Analysis for Chemical Mechanical Planarization (CMP) Slurries by Geographic Region, 2018, 2022 & 2029
2.1.3 World Current & Future Analysis for Chemical Mechanical Planarization (CMP) Slurries by Country/Region, 2018, 2022 & 2029
2.2 Chemical Mechanical Planarization (CMP) Slurries Segment by Type
2.2.1 Prestonian Type
2.2.2 Non-Prestonian Type
2.3 Chemical Mechanical Planarization (CMP) Slurries Sales by Type
2.3.1 Global Chemical Mechanical Planarization (CMP) Slurries Sales Market Share by Type (2018-2023)
2.3.2 Global Chemical Mechanical Planarization (CMP) Slurries Revenue and Market Share by Type (2018-2023)
2.3.3 Global Chemical Mechanical Planarization (CMP) Slurries Sale Price by Type (2018-2023)
2.4 Chemical Mechanical Planarization (CMP) Slurries Segment by Application
2.4.1 Silicon Wafers
2.4.2 Optical Substrates
2.4.3 Disk-drive Components
2.4.4 Other
2.5 Chemical Mechanical Planarization (CMP) Slurries Sales by Application
2.5.1 Global Chemical Mechanical Planarization (CMP) Slurries Sale Market Share by Application (2018-2023)
2.5.2 Global Chemical Mechanical Planarization (CMP) Slurries Revenue and Market Share by Application (2018-2023)
2.5.3 Global Chemical Mechanical Planarization (CMP) Slurries Sale Price by Application (2018-2023)
3 Global Chemical Mechanical Planarization (CMP) Slurries by Company
3.1 Global Chemical Mechanical Planarization (CMP) Slurries Breakdown Data by Company
3.1.1 Global Chemical Mechanical Planarization (CMP) Slurries Annual Sales by Company (2018-2023)
3.1.2 Global Chemical Mechanical Planarization (CMP) Slurries Sales Market Share by Company (2018-2023)
3.2 Global Chemical Mechanical Planarization (CMP) Slurries Annual Revenue by Company (2018-2023)
3.2.1 Global Chemical Mechanical Planarization (CMP) Slurries Revenue by Company (2018-2023)
3.2.2 Global Chemical Mechanical Planarization (CMP) Slurries Revenue Market Share by Company (2018-2023)
3.3 Global Chemical Mechanical Planarization (CMP) Slurries Sale Price by Company
3.4 Key Manufacturers Chemical Mechanical Planarization (CMP) Slurries Producing Area Distribution, Sales Area, Product Type
3.4.1 Key Manufacturers Chemical Mechanical Planarization (CMP) Slurries Product Location Distribution
3.4.2 Players Chemical Mechanical Planarization (CMP) Slurries Products Offered
3.5 Market Concentration Rate Analysis
3.5.1 Competition Landscape Analysis
3.5.2 Concentration Ratio (CR3, CR5 and CR10) & (2018-2023)
3.6 New Products and Potential Entrants
3.7 Mergers & Acquisitions, Expansion
4 World Historic Review for Chemical Mechanical Planarization (CMP) Slurries by Geographic Region
4.1 World Historic Chemical Mechanical Planarization (CMP) Slurries Market Size by Geographic Region (2018-2023)
4.1.1 Global Chemical Mechanical Planarization (CMP) Slurries Annual Sales by Geographic Region (2018-2023)
4.1.2 Global Chemical Mechanical Planarization (CMP) Slurries Annual Revenue by Geographic Region (2018-2023)
4.2 World Historic Chemical Mechanical Planarization (CMP) Slurries Market Size by Country/Region (2018-2023)
4.2.1 Global Chemical Mechanical Planarization (CMP) Slurries Annual Sales by Country/Region (2018-2023)
4.2.2 Global Chemical Mechanical Planarization (CMP) Slurries Annual Revenue by Country/Region (2018-2023)
4.3 Americas Chemical Mechanical Planarization (CMP) Slurries Sales Growth
4.4 APAC Chemical Mechanical Planarization (CMP) Slurries Sales Growth
4.5 Europe Chemical Mechanical Planarization (CMP) Slurries Sales Growth
4.6 Middle East & Africa Chemical Mechanical Planarization (CMP) Slurries Sales Growth
5 Americas
5.1 Americas Chemical Mechanical Planarization (CMP) Slurries Sales by Country
5.1.1 Americas Chemical Mechanical Planarization (CMP) Slurries Sales by Country (2018-2023)
5.1.2 Americas Chemical Mechanical Planarization (CMP) Slurries Revenue by Country (2018-2023)
5.2 Americas Chemical Mechanical Planarization (CMP) Slurries Sales by Type
5.3 Americas Chemical Mechanical Planarization (CMP) Slurries Sales by Application
5.4 United States
5.5 Canada
5.6 Mexico
5.7 Brazil
6 APAC
6.1 APAC Chemical Mechanical Planarization (CMP) Slurries Sales by Region
6.1.1 APAC Chemical Mechanical Planarization (CMP) Slurries Sales by Region (2018-2023)
6.1.2 APAC Chemical Mechanical Planarization (CMP) Slurries Revenue by Region (2018-2023)
6.2 APAC Chemical Mechanical Planarization (CMP) Slurries Sales by Type
6.3 APAC Chemical Mechanical Planarization (CMP) Slurries Sales by Application
6.4 China
6.5 Japan
6.6 South Korea
6.7 Southeast Asia
6.8 India
6.9 Australia
6.10 China Taiwan
7 Europe
7.1 Europe Chemical Mechanical Planarization (CMP) Slurries by Country
7.1.1 Europe Chemical Mechanical Planarization (CMP) Slurries Sales by Country (2018-2023)
7.1.2 Europe Chemical Mechanical Planarization (CMP) Slurries Revenue by Country (2018-2023)
7.2 Europe Chemical Mechanical Planarization (CMP) Slurries Sales by Type
7.3 Europe Chemical Mechanical Planarization (CMP) Slurries Sales by Application
7.4 Germany
7.5 France
7.6 UK
7.7 Italy
7.8 Russia
8 Middle East & Africa
8.1 Middle East & Africa Chemical Mechanical Planarization (CMP) Slurries by Country
8.1.1 Middle East & Africa Chemical Mechanical Planarization (CMP) Slurries Sales by Country (2018-2023)
8.1.2 Middle East & Africa Chemical Mechanical Planarization (CMP) Slurries Revenue by Country (2018-2023)
8.2 Middle East & Africa Chemical Mechanical Planarization (CMP) Slurries Sales by Type
8.3 Middle East & Africa Chemical Mechanical Planarization (CMP) Slurries Sales by Application
8.4 Egypt
8.5 South Africa
8.6 Israel
8.7 Turkey
8.8 GCC Countries
9 Market Drivers, Challenges and Trends
9.1 Market Drivers & Growth Opportunities
9.2 Market Challenges & Risks
9.3 Industry Trends
10 Manufacturing Cost Structure Analysis
10.1 Raw Material and Suppliers
10.2 Manufacturing Cost Structure Analysis of Chemical Mechanical Planarization (CMP) Slurries
10.3 Manufacturing Process Analysis of Chemical Mechanical Planarization (CMP) Slurries
10.4 Industry Chain Structure of Chemical Mechanical Planarization (CMP) Slurries
11 Marketing, Distributors and Customer
11.1 Sales Channel
11.1.1 Direct Channels
11.1.2 Indirect Channels
11.2 Chemical Mechanical Planarization (CMP) Slurries Distributors
11.3 Chemical Mechanical Planarization (CMP) Slurries Customer
12 World Forecast Review for Chemical Mechanical Planarization (CMP) Slurries by Geographic Region
12.1 Global Chemical Mechanical Planarization (CMP) Slurries Market Size Forecast by Region
12.1.1 Global Chemical Mechanical Planarization (CMP) Slurries Forecast by Region (2024-2029)
12.1.2 Global Chemical Mechanical Planarization (CMP) Slurries Annual Revenue Forecast by Region (2024-2029)
12.2 Americas Forecast by Country
12.3 APAC Forecast by Region
12.4 Europe Forecast by Country
12.5 Middle East & Africa Forecast by Country
12.6 Global Chemical Mechanical Planarization (CMP) Slurries Forecast by Type
12.7 Global Chemical Mechanical Planarization (CMP) Slurries Forecast by Application
13 Key Players Analysis
13.1 Cabot Microelectronics
13.1.1 Cabot Microelectronics Company Information
13.1.2 Cabot Microelectronics Chemical Mechanical Planarization (CMP) Slurries Product Portfolios and Specifications
13.1.3 Cabot Microelectronics Chemical Mechanical Planarization (CMP) Slurries Sales, Revenue, Price and Gross Margin (2018-2023)
13.1.4 Cabot Microelectronics Main Business Overview
13.1.5 Cabot Microelectronics Latest Developments
13.2 DuPont
13.2.1 DuPont Company Information
13.2.2 DuPont Chemical Mechanical Planarization (CMP) Slurries Product Portfolios and Specifications
13.2.3 DuPont Chemical Mechanical Planarization (CMP) Slurries Sales, Revenue, Price and Gross Margin (2018-2023)
13.2.4 DuPont Main Business Overview
13.2.5 DuPont Latest Developments
13.3 Fujifilm
13.3.1 Fujifilm Company Information
13.3.2 Fujifilm Chemical Mechanical Planarization (CMP) Slurries Product Portfolios and Specifications
13.3.3 Fujifilm Chemical Mechanical Planarization (CMP) Slurries Sales, Revenue, Price and Gross Margin (2018-2023)
13.3.4 Fujifilm Main Business Overview
13.3.5 Fujifilm Latest Developments
13.4 Hitachi Chemical
13.4.1 Hitachi Chemical Company Information
13.4.2 Hitachi Chemical Chemical Mechanical Planarization (CMP) Slurries Product Portfolios and Specifications
13.4.3 Hitachi Chemical Chemical Mechanical Planarization (CMP) Slurries Sales, Revenue, Price and Gross Margin (2018-2023)
13.4.4 Hitachi Chemical Main Business Overview
13.4.5 Hitachi Chemical Latest Developments
13.5 Fujimi Incorporated
13.5.1 Fujimi Incorporated Company Information
13.5.2 Fujimi Incorporated Chemical Mechanical Planarization (CMP) Slurries Product Portfolios and Specifications
13.5.3 Fujimi Incorporated Chemical Mechanical Planarization (CMP) Slurries Sales, Revenue, Price and Gross Margin (2018-2023)
13.5.4 Fujimi Incorporated Main Business Overview
13.5.5 Fujimi Incorporated Latest Developments
14 Research Findings and Conclusion
※参考情報 化学的機械的平坦化(CMP)スラリーは、半導体製造プロセスにおいて重要な役割を果たす材料です。CMPは、シリコンウェハーやその他の基板の表面を平坦化するための技術であり、そのプロセスには化学的および機械的なメカニズムが関与します。このプロセスは、微細な構造物を製造する際に必要不可欠であり、特に集積回路(IC)の製造過程において、トランジスタや配線のパターンを正確に配置するために必要な高精度な平面性を実現します。 CMPスラリーは、このCMPプロセスで使用される研磨剤と化学薬品の混合物です。スラリーの主な役割は、研磨作用によりウェハーの表面を削り、同時に化学反応を通じて表面の反応性を高めたり、特定の材料を除去したりすることです。この工程において、スラリーの成分や性質は、平坦化の効率や仕上がりに大きく影響します。 CMPスラリーの特徴には、いくつかの重要な要素があります。まず、スラリーは高い物理的安定性を持たなければなりません。これは、長時間の使用に耐え、粒子の沈降や凝集が起こらないようにするためです。また、スラリーに含まれる研磨粒子の大きさや形状、分散状態も重要です。これらの要素は、研磨能力や表面粗さに直接影響を与えます。 スラリーの種類は、主要な成分に基づいて分類されます。一般的には、アルミナ、シリカ、酸化鉄などの無機研磨粒子を含むスラリーがあります。これらの粒子は、特定の材料に対して選択的に反応し、効果的な平坦化を実現します。さらに、バッファー、酸、アルカリなどの化学薬品も含まれており、これらが反応を促進し、物理的な研磨作用を補完します。 CMPスラリーの用途は多岐にわたりますが、主な用途は半導体デバイスの製造です。特に、トランジスタや配線が設計される微細な構造物を持つICの製造において、CMPは不可欠な技術とされています。また、CMPは薄膜デバイスや太陽電池、液晶ディスプレイの生産にも活用されており、多くの産業において重要な役割を果たしています。 関連技術としては、CMP自体の機構に加えて、その他の平坦化技術も考えられます。例えば、エッチング技術やCVD(化学気相成長)などは、CMPと組み合わせて使用されることが一般的です。エッチングは特定の材料を選択的に削るための手法であり、CMPはその後の平坦化処理を行うために使用されます。このように、CMPは他の製造プロセスと連携することで、より高品質なデバイスの製造を実現しています。 CMPスラリーの進化も見逃せない点です。半導体の微細化が進む中で、より高い平面性と表面粗さが求められるため、スラリーの開発も進化しています。新しい材料や合成方法が研究され、より高性能なスラリーが登場しています。これは、産業界のニーズに応えるために必要な進展であり、CMPスラリーの市場は今後も拡大していくと予想されています。 CMPは、半導体産業における革新を支える基本的な技術であり、CMPスラリーはその中心的な役割を果たしています。この技術の更なる発展は、より高性能なデバイスの実現や、さらなる微細化を可能にする鍵となるでしょう。 CMPスラリーの研究開発は、今後の技術革新においてますます重要な要素となると考えられます。 |